@Tim Edwards Correct me if I'm wrong, but I don't think the gf180mcu tech file has been updated to connect butting diffusion with different implants.
I created an issue here. https://github.com/RTimothyEdwards/open_pdks/issues/492
The gf180mcu process uses salicide to reduce the resistance of diffusion and poly. This has the consequence of causing abutting diffusion with different implants (N+ and P+) to be electrically shor...
Sorry.
I don't really have a test case setup.